New Product Launch: FITOK Ultra High Purity Filters

FITOK Ultra High Purity Filters

 

Introduction

 

 

FITOK FP Series Ultra High Purity Filters feature a removal rating of 0.003 μm. Designed with a PTFE filter element, these filters offer excellent chemical compatibility, making them ideal for filtering gases in various semiconductor manufacturing processes such as CVD, PVD, and dry etching.

 

Features

 

 

  • Particle removal rating of ≥ 0.003 μm, with a filter efficiency greater than 99.9999999% at maximum flow rate
  • Excellent chemical compatibility
  • 100% helium leak tested

 

Technical Data

 

 

 
Material Filter Element PTFE
Support PFA
Housing 316L SS or 316L VAR
Removal Rating ≥ 0.003 μm
Filter Efficiency (Log Reduction Value) > 99.9999999% (9LRV)
Helium Leak Rate < 1×10-9 std cm3/s
Recommended Work Flow Rate 0~60 slpm
(0~2.1 scfm)
0~120 slpm
(0~4.2 scfm)
0~500 slpm
(0~17.7 scfm)
0~1000 slpm
(0~35.3 scfm)
Max. Working Pressure 3000 psig ((207 bar)) 1000 psig ((68.9 bar))
Max. Positive Differential Pressure 58 psig (4 bar) @ 23 °C 87 psig (6 bar) @ 23 °C
Max. Negative Differential Pressure 10 psig (0.7 bar) @ 23 °C 44 psig (3 bar) @ 23 °C
Max. Working Temperature -22 ~ 248 °F (-30 ~ 120 °C)

 

Please see the FP Series Ultra High Purity Filters Catalog for more information. Should you have any questions, please contact us directly and we will reach you soon.

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