Atomic Layer Deposition Diaphragm Valves, ALD Series

Ideal for Atomic Layer Deposition (ALD) and Atomic Layer Etching (ALE) technologies

Atomic Layer Deposition (ALD) is a method of applying thin films to various substrates with atomic scale precision. As chip node dimensions are continuously shrinking, traditional deposition techniques have reached their limits. Depositing ultra-thin layer at the nanoscale requires Atomic Layer Deposition (ALD) technology, which allows materials to be deposited one atomic layer at a time. ALD series diaphragm valves are used to deliver precise doses of gases during the deposition process used to create semiconductor chips.

Features

Ultra long cycle life
No dead space in the flow path
High Cv consistency and stability
Quick response to offer a total opening / closing response time of less than 15 ms
Standard and thermal types optional, the thermal type has a working temperature up to 392°F (200°C)
For the valve fitted with a solenoid valve, the solenoid valve is circularly rotatable along the actuator for easy position adjustment

View Atomic Layer Deposition Diaphragm Valves, ALD Series

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